Publication
Advanced Redox Technology Lab
Conference Abstract
Removal of organic compounds by the ZVAl/H2O2 system in the presence of chloride ion at neutral pH
- Conference
- 한국공업화학회 춘계학술연구발표회
- Date
- 2014.04.30. ~ 2014.05.02.
- Section
- 발표
- Year
- 2014
이혜진, 이홍신, 서지원, 신민정, 이창하, Removal of organic compounds by the ZVAl/H2O2 system in the presence of chloride ion at neutral pH, 한국공업화학회 춘계학술연구발표회, 2014, 4월 30일-5월 2일.