Publication

Advanced Redox Technology Lab

Journal papers

Defect-Rich Cu2O Nanospheres as a Fenton-Like Catalyst for Cu(III) Generation: Enhanced Inactivation of Antibiotic-Resistant Bacteria and Genes
Author
J. Cho, J. Lee, A. T. Lee, Y. Kim, D. Kang, J. Kim, E. J. Park, J. Lee, K. Kim, M. Jung, T. Hyeon, C. Lee
Journal
ACS Nano
Issue / Vol
vol. 19, p. 30137
Date
(2025.08.26)
Year
2025

Cupryl species (Cu(III)) are promising oxidants for degrading recalcitrant organic contaminants and harmful microorganisms in water. In this study, defect-rich cuprous oxide (D-Cu2O) nanospheres (NSs) are introduced as a Fenton-like catalyst to generate Cu(III) for the inactivation of antibiotic-resistant bacteria (ARB) and antibiotic resistance genes (ARGs). D-Cu2O, in the presence of H2O2, achieved inactivation efficiencies 3.2, 3.0, and 2.4 times higher than those of control Cu2O for ARB, extracellular ARGs (e-ARGs), and intracellular ARGs (i-ARGs), respectively. Experimental evidence from oxidant scavenging tests, Cu(III)-periodate complexation assays, electron paramagnetic resonance (EPR), and in situ Raman spectroscopy confirmed that D-Cu2O significantly enhanced Cu(III) generation when reacting with H2O2 compared to control Cu2O. Density functional theory (DFT) calculations further revealed that unsaturated copper atoms in D-Cu2O enhance H2O2 adsorption by improving the structural accessibility of adjacent oxygen atoms. This facilitates electron transfer processes and promotes subsequent Cu(III) generation. The D-Cu2O/H2O2 system demonstrated excellent reusability, maintaining a 4-log reduction of ARB over five cycles, and proved effective across various water matrices and microbial species. These findings highlight the potential of the D-Cu2O/H2O2 system, driven by defect engineering, as a robust platform for enhancing water safety and advancing sustainable disinfection technologies.

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